John K. Etter joined the Rodney Law firm at its establishment in 2003 and became a member of the firm in 2005. He has experience in the areas of commercial litigation, with a focus on science and technology, intellectual property and class action defense, particularly for environmental toxic torts.
Mr. Etter graduated from the Tulane University School of Law in 1997, where he was a member of the Tulane Law Review. Mr. Etter is licensed to practice before all Louisiana and Texas State Courts, the U.S. District Courts for the Eastern, Western and Middle Districts of Louisiana, and the U.S. Courts of Appeals for the Fifth and Sixth Circuit. A registered patent attorney, John is admitted to practice before the United States Patent and Trademark Office. John K. Etter is also a registered professional engineer.
Mr. Etter has been a practicing attorney for fourteen years, specializing in complex litigation cases, including breach of contract and multiple class action/toxic tort cases. He has worked with Mr.. Rodney throughout his legal career and together they provide clients with a range of commercial litigation services. In addition to his leading edge work in litigation and commercial contracts, Mr. Etter is proud of his participation in the firm’s pro bono work, including obtaining the first copyrights for Mardi Gras Indian suits, protecting the unique cultural heritage of New Orleans, and the firm’s efforts after the flooding of New Orleans to assure the rights of displaced New Orleans residents to vote for local elected officials.
Prior to obtaining his law degree, Mr. Etter worked as an engineer, spending fifteen years in product development, quality assurance and regulatory compliance in the medical electronics and computer equipment fields. This analytical background enables him to better understand and analyze complex technical legal cases and provide clients with better services. Mr. Etter is an active member of the governing boards of Central St. Matthew United Church of Christ, and is an amateur glass blower.